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Professor Dr. rer. nat. Bernd Szyska


Publikationen

2015

Muydinov, R.; Steigert, A.; Schoenau, S.; Ruske, F.; Kraehnert, R.; Eckhardt, B.; Lauermann, I.; Szyszka, B.: Water-assisted nitrogen mediated crystallisation of ZnO films. In: Thin Solid Films 590 (2015), S. 177-83

Muydinov, R.; Ruske, F.; Neubert, S.; Steigert A.; Klaus, M.; Selve, S.; Köppel, G.; Szyszka, B.: Combination of Nitrogen Mediated Crystallization with Post-Deposition Annealing - towards Ultra-Thin ZnO:Al Contacts. In: Thin Sold Films 589 (2015), S. 750-4

Sittinger, V.; Pflug, A.; Dewald, W.; Jung, S.; Britze, C.; Kaiser, A.; Werner, W.; Szyszka, B.; Bräuer, G.: Rotatable serial co-sputtering of doped titania. In: Vacuum 114 (2015}, S. 158-61

Schroder, S.; Dogan, O.; Schneidewind, J.; Bertotti, G.; Keil, S.; Gargouri, H.; Arens, M.; Brose, E.; Bruns, J.; Wolansky, D.; Tillack, B.; Vassanelli, S.; Szyszka, B.; Thewes, R.: Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications. In: 6th International Workshop on Advances in Sensors and Interfaces (IWASI) Proceedings (2015), S. 21-4

 

2014

Scherg-Kurmes, H.; Ring, S.; Calnan, S.; Stannowski, B.; Szyszka, B.; Schlatmann, R.; Rech, B.: Comparative study of backside reflectors on a-Si:H/µc-Si:H thin film solar cells. In: physica status solidi (a) 211 (2014), S. 2078-8

Stannowski, B.; Ruske, F.; Neubert, S.; Schoenau, S.; Ring, S.; Calnan, S.; Wimmer, M.; Gabriel, O.; Szyszka, B.; Rech, B.; Schlatmann, R.: Potential of high-mobility sputtered zinc oxide as front contact for high efficiency thin film silicon solar cells. In: Thin Solid Films 555 (2014), S. 138-42

Siemers, M.; Pflug, A.; Melzig, T.; Gehrke, K.; Weimar, A.; Szyszka, B.: Model based investigation of Ar+ ion damage in DC magnetron sputtering. In: Surface and Coatings Technology 241 (2014), S. 50-3

 

2013

Sittinger, V.; Lenck, O.; Vergöhl, M.; Szyszka, B.; Bräuer, G.: Applications of HIPIMS metal oxides. In: Thin Sold Films 548 (2013), S. 18-26

 

 

Ältere Publikationen (1997 - 2010)

[1] Weber, A.; Szyszka, B.; Bringmann, U.; Ghadesi, A.; Siegesmund, M.: Entwicklung von transparenten und leitfähigen Oxidschichten. In: Statusseminar Oberflächen- und Schichttechnologien (Düsseldorf 1997). Düsseldorf : VDI Technologiezentrum, 1997, Band 2, S. 515-9

[2] Daube, C.; Fankenberger, H.; Stollenwerk, J.; Szyszka, B.; Weber, A.: High rate MgO sputter source for PDP applications. In: Proceedings of the 4th international display workshop (Japan, Nagoya 19.-21.11.1997

[3] Szyszka, B.; Jäger, S.: Optical and electrical properties of doped zinc oxide films prepared by AC reactive magnetron sputtering. In: Journal of non-crystalline solids 218 (1997), S. 74-8

[4] Jäger, S.; Szyszka, B.; Szczyrbowski, J.; Bräuer, G.: Comparison of transparent conductive oxide thin films prepared by AC and DC reactive magnetron sputtering. In: Surface and coatings technology 98 (1998), S. 1304-14

[5] Szyszka, B.: Entwicklung von Wärmedämmungs­schichtsystemen für die großflächige Glasbeschichtung – Teilprojekt Entwicklung von transparenten und leitfähigen Oxidschichten, Abschlussbericht (FKZ 13N6520).
Braunschweig : Fraunhofer IST, 1998

[6] Szyszka, B.: Reaktives Magnetronsputtern von TCO-Schichtsystemen - eine neue Technologie für kosten­günstige wärmedämmende Beschichtungen. In: Kolloquium "Beschichtung von Architekturglas zur Wärmedämmung" (Düsseldorf : VDI-Technologiezentrum Physikalische Technologien, 03.11.1999), Kurzfassung der Vorträge, S. 19-24

[7] Szyszka, B.: Transparent and conductive ZnO:Al films prepared by reactive MF magnetron sputtering at high deposition rate. In: Proceedings of the European Conference on Advanced Materials and Processes and Applications EUROMAT (München 27.-30.09.1999). Weinheim : Wiley-VCH, 2000, S. 380-6

[8] Szyszka, B.: Reaktives Magnetronsputtern von transparenten und leitfähigen Oxidschichten. In: Fraunhofer IST (Hrsg.): Berichte aus Forschung und Entwicklung. Stuttgart : Fraunhofer IRB Verlag, 2000. Zugleich: Justus Liebig Universität Gießen, Dissertation, 1999

[9] Szyszka, B.: Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering. In: Thin Solid Films 351 (1999), S. 164-9

[10] Szyszka, B.: Kein Reflex bei dickem Silber. In: Glas und Rahmen (1999), Nr. 4,
S. 31-2

[11] Szyszka, B.: Reaktives Magnetronsputtern von transparenten und leitfähigen Oxidschichten. In: Journal für Oberflächentechnik (1999), Nr. 11, S. VI-XII

[12] Szyszka, B.: Properties of TCO films prepared by reactive magnetron sputtering. In: SVC Annual Technical Conference Proceedings 43 (2000), S. 187-192

[13] Kluth, O.; Müller, J.; Schöpe, G.; Rech, B.; Ruske, M.; Trube, J.; Szyszka, B.; Höing, T.; Jiang, X.; Bräuer, G.: Texture-etched Zinc Oxide Substrates for Silicon Thin Film Solar Cells: From Laboratory Size to Large Areas. In: Proceedings of the 7th Euregional Workshop on Thin Film Silicon Solar Cells (Barcelona 26.-27.10.2000)

[14] Müller, J.; Schöpe, G.; Kluth, O.; Rech, B.; Ruske, M.; Trube, J.; Szyszka, B.; Höing, T.; Jiang, X.; Bräuer, G.: Texture-etched Zinc Oxide Substrates for Silicon Thin Film Solar Cells - from Laboratory Size to Large Areas. In: Proceedings of the 28th IEEE Photovoltaic Specialists Conference(USA, Anchorage 17.-22.09.2000)

[15] Szyszka, B.; Jiang, X.; Höing, T.; Pöckelmann, R.; Bringmann, U.; Bräuer, G.: TCO-coating of polymer substrates using reactive MF-magnetron sputtering of ZnO:Al layers. In: Proceedings of the 3rd International Conference on Coatings on Glass ICCG (Maastricht 29.10.-02.11.2000), S. 119

[16] Vergöhl, M.; Hunsche, B.; Malkomes, N.; Matthée, T.; Szyszka, B.: Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics. In: Journal of vacuum science and technology A 18 (2000), S. 1709-12

[17] Vergöhl, M.; Malkomes, N.; Szyszka, B.; Neumann, F.; Matthée, T.; Bräuer, G.: Optimization of the reflectivity of magnetron sputter deposited silver films. In: Journal of vacuum science and technology A 18 (2000), S. 1632-7

[18] Malkomes, N.; Bierhals, A.; Szyszka, B.; Vergöhl, M.: Dynamic simulation of process control of the reactive sputter process using two targets and experimental results. In: SVC Annual Technical Conference Proceedings 44 (2001), S. 13-9

[19] Szyszka, B.; Höing, T.; Jiang, X.; Bierhals, A.; Bringmann, U.; Bräuer, G.: Large area deposition of transparent and conductive ZnO:Al layers by reactive midfrequency magnetron sputtering. In: SVC Annual Technical Conference Proceedings 44 (2001), S. 272-6

[20] Szyszka, B.: Transparente und leitfähige Oxidschichten. In: Vakuum in Forschung und Praxis 13 (2001), Nr.1, S. 38-45

[21] Hunsche, B.; Vergöhl, M.; Neuhäuser, H.; Klose, F.; Szyszka, B., Mattheé, T.: Effect of deposition parameters on optical and mechanical properties of MF- and DC-sputtered Nb2O5 films. In: Thin Solid Films 392 (2001), S. 184-90

[22] Müller, J.; Schöpe, G.; Kluth, O.; Rech, B.; Ruske, M.; Trube, J.; Szyszka, B.; Jiang, X.; Bräuer, G.: Up scaling of texture-etched zinc oxide substrates for silicon thin film solar cells. In: Thin Solid Films 392 (2001), S. 327-33

[23] Malkomes, N.; Vergöhl, M.; Szyszka, B.: Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputtering. In: Journal of vacuum science and technology. A, Vacuum, surfaces and films 19 (2001), S. 414-9

[24] Malkomes, N.; Szyszka, B.: Nonclassical impedance control of the high rate midfrequency reactive magnetron sputter process using harmonic analysis. In: Journal of vacuum science and technology A 19 (2001), S. 2368-72

[25] Pflug, A.; Malkomes, N.; Sittinger, V.; Szyszka, B.: Simulation of reactive magnetron sputtering kinetics in real in-line processing chambers. In: SVC Annual Technical Conference Proceedings 45 (2002), S. 16-21

[26] Müller, J.; Schöpe, G.; Kluth, O.; Rech, B.; Sittinger, V.; Szyszka, B., Geyer, R.; Lechner, P.; Schade, H.; Ruske, M.; Dittmar, G.; Bochem, H.-P.: State-of-the-art mid-frequency sputtered ZnO films for thin film silicon solar cells and modules. In: Proceedings of the 4th International Conference on Coatings on Glass (Braunschweig 03.-07.11.2002), S. 505-12

[27] Pflug, A.; Sittinger, V.; Szyszka, B.; Dittmar, G.: Modeling of NIR free carrier absorption in aluminum-doped zinc oxide layers using the simulation system RIG-VM. In: Proceedings of the 4th International Conference on Coatings on Glass (Braunschweig 03.-07.11.2002), S. 315-21

[28] Szyszka, B.; Sittinger, V.; Jiang, X.; Hong, R. J.; Werner, W.; Pflug, A.; Ruske, M.; Lopp, A.: Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering. In: Thin Solid Films 442 (2003), S. 179-83

[29] Hong, R. J.; Jiang, X.; Sittinger, V.; Szyszka, B.; Höing, T.; Bräuer, G.; Heide, G.; Frischat, G. H.: Uniformity in large area ZnO:Al films prepared by reactive midfrequency magnetron sputtering. In: Journal of vacuum science and technology A 20 (2002), S. 900-5

[30] Szyszka, B.: Thin films for automotive glazing - today and tomorrow. In: Journal für Oberflächentechnik 42 (2002), Nr. 7, S. 44-6

[31] Szyszka, B.: Moderne Schicht- und Oberflächentechnik. In: Branchen Index Galvanotechnik und dünne Schichten, Herausgegeben von JOT (2002),
S. 82-5

[32] Szyszka, B.; Sittinger, V.; Jiang, X.; Pflug, A.; Werner, W.; Ruske, M.: Transparent and conductive ZnO:Al films. In: Precision (2002), August, S. 14-7

[33] Lepski, D.; Mollath, G.; Szyszka, B.; Völlmar, S.: Simulation komplexer oberflächentechnischer Produktionsprozesse. In: Journal für Oberflächentechnik 42 (2002), Nr.1, S.IV-VIII

[34] Jiang, X.; Jia, C. L.; Szyszka, B.: Manufacture of specific structure of aluminum-doped zinc oxide films by patterning the substrate surface. In: Applied Physics Letters 80 (2002), S. 3090-2

[35] He, Y. B.; Kriegseis, W.; Krämer, T.; Polity, A.; Hardt, M.; Szyszka, B.; Meyer, B. K.: Deposition of CuInS2 thin films by RF reactive sputtering with a ZnO:Al buffer layer. In: Journal of the Physics and Chemistry of Solids 64 (2003), S. 2075-9

[36] Hong, R. J.; Jiang, X.; Heide, G.; Szyszka, B.; Sittinger, V.; Werner, W.: Growth behaviors and properties of the ZnO:Al films prepared by reactive mid-frequency magnetron sputtering. In: Journal of Crystal Growth 249 (2003), S. 461-9

[37] Hong, R. J.; Jiang, X.; Szyszka, B.; Sittinger, V.; Pflug, A.: Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering. In: Applied Surface Science 207 (2003), S. 341-50

[38] Hong, R. J.; Jiang, X.; Szyszka, B.; Sittinger, V.; Xu, S. H.; Werner, W.; Heide, G.: Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputtering. In: Journal of Crystal Growth 253 (2003), S. 117-28

[39] Pflug, A.; Szyszka, B.; Niemann, J.: Simulation of reactive sputtering kinetics in real in-line processing chambers. In: Thin Solid Films 442 (2003), S. 21-6

[40] Pflug, A.; Szyszka, B.; Sittinger, V.; Niemann, J.: Process simulation for advanced large area optical coatings. In: SVC Annual Technical Conference Proceedings 46 (2003), S. 241-7

[41] Pflug, A.; Szyszka, B.; Niemann, J.: Simulation des reaktiven Magnetron-Sputterprozesses in in-line Anlagen. In: JOT (2003), Nr. 1, S. X-XIII

[42] Sittinger, V.; Szyszka, B.; Hong, R. J.; Werner, W.; Ruske, M.; Lopp, A.: New cost effective ZnO:Al films deposited by large area reactive magnetron sputtering. In: Proceedings of 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, 11-18.05.2003: Arisumi Printing Inc, 2003, S. 503-6

[43] Szyszka, B.; Sittinger, V.; Jiang, X.; Hong, R. J.; Werner, W.; Pflug, A.; Ruske, M.; Lopp, A.: Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering. In: Thin Solid Films 442 (2003), S. 179-83

[44] Szyszka, B.: Trends in der Dünnschichttechnik. In: Branchen Index Galvanotechnik und dünne Schichten, Herausgegeben von JOT (2003)

[45] Hong, R. J.; Helming, K.; Jiang, X.; Szyszka, B.: Texture analysis of Al-doped ZnO thin films prepared by in-line reactive MF magnetron sputtering. In: Applied Surface Science 226 (2004), S. 378-86

[46] Pflug, A.; Sittinger, V.; Ruske, F.; Szyszka, B.; Dittmar, G.: Optical characterization of aluminum-doped zinc oxide films by advanced dispersion theories In: Thin Solid Films 455-456 (2004), S. 201-6

[47] Pflug, A.; Szyszka, B.; Geisler, M.; Kastner, A.; Braatz, C.; Schreiber, U.;
Bruch, J.: Modeling of the film thickness distribution along transport direction in In-line coaters for reactive sputtering In: SVC Annual Technical Conference Proceedings 47 (2004), S. 155-60

[48] Szyszka, B.: Nanotechnologie auf dem Vormarsch. In: Branchen Index Galvanotechnik und dünne Schichten, Herausgegeben von JOT (2004)

[49] Christie, D. J.; Pflug, A.; Sittinger, V.; Ruske, F.; Siemers, M.; Szyszka, B.: Model prediction and empirical confirmation of rate scaling with peak power for high power pulse magnetron sputtering (HPPMS) deposition of thin Ag films. In: SVC Annual Technical Conference Proceedings 48 (2005), S. 501-5

[50] Diehl, W.; Sittinger, V.; Szyszka, B.: Thin film solar cell technology in Germany. In: Surface and Coatings Technology (2005), S. 29-34

[51] Pflug, A.; Siemers, M.; Szyszka, B.; Kappertz, O.; Nyberg, T.; Berg, S.; Severin, D.; Wuttig, M.: Modeling of the plasma impedance in reactive magnetron sputtering for various target materials. In: SVC Annual Technical Conference Proceedings 48 (2005), S. 298-301

[52] Pflug, A.; Szyszka, B.; Bräuer, G.: Simulation of in-line sputtering coaters. In: Glass Coatings Nr. 1 (2005), S. 38-40

[53] Ruske, F.; Sittinger, V.; Werner, W.; Szyszka, B.; van Osten, K. U.; Dietrich, K.; Rix, R.: Hydrogen doping of ZnO:Al films deposited by pulsed DC-sputtering of ceramic targets In: SVC Annual Technical Conference Proceedings 48 (2005), S. 302-7

[54] Ruske, F.; Sittinger, V.; Werner, W.; Szyszka, B.; Dietrich, K.; Rix, R.; van Osten, K. U.: Hydrogen Doping of DC sputtered ZnO:Al films from novel target material. In: Surface and Coatings Technology 200 (2005), S. 236-40

[55] Sittinger, V.; Ruske, F.; Werner, W.; Szyszka, B.; Rech, B.; Hüpkes, J.; Schöpe, G.; Stiebig, H.: ZnO:Al films deposited by in-line reactive AC magnetron sputtering for a-Si:H thin film solar cells. In: Thin Solid Films 496 (2006), S. 16-25

[56] Szyszka, B.: Kleine große Nanowelt: Deutschland als Wachstums-Lokomotive der EU. In: Branchen Index Galvanotechnik und dünne Schichten, Herausgegeben von JOT (2005)

[57] Szyszka, B.; Sittinger, V.; Ruske, F.; Werner, W.; Pflug, A.; Rech, B.: ZnO:Al films for a-Si:H thin film solar cells. In: SVC Annual Technical Conference Proceedings 48 (2005), S. 691-3

[58] Pflug, A.; Siemers, M.; Szyszka, B.: Parallel DSMC Gasflow Simulation of an In-Line Coater for Reactive Sputtering. In: Lecture Notes in Computer Science 4192 (2006), S. 383-90

[59] Ruske, F.; Pflug, A.; Sittinger, V.; Werner, W.; Szyszka, B.: Process stabilisation for large area reactive MF-sputtering of Al-doped ZnO. In: Thin Solid Films 502 (2006), S. 44-9

[60] Sittinger, V.; Ruske, F.; Werner, W.; Szyszka, B.; Rech, B.; Hüpkes, J.; Schöpe, G.; Stiebig, H.: ZnO:Al films deposited by in-line reactive AC magnetron sputtering for a-Si:H thin film solar cells. In: Thin Solid Films 496 (2006), S. 16-25

[61] Sittinger, V.; Ruske, F.; Gerloff, C.; Werner, W.; Szyszka, B.; Christie, D. J.: Deposition of high conductive ITO films by HPPMS. In: SVC Annual Technical Conference Proceedings 49 (2006), S. 343-8

[62] Sittinger, V.; Pflug, A.; Werner, W.; Rickers, C.; Vergöhl, M.; Kaiser, A.; Szyszka, B.: Production of MF and DC-pulse sputtered anti-reflective/anti-static optical interference coatings using a large area in-line coater. In: Thin Solid Films 502 (2006), S. 175-80

[63] Szyszka, B.; Gochermann, J.; Ondratschek, D.; Roths, K.; Schmidt, B.; Stenzel, V.; Uhlmann, P.: Forschungsagenda Oberfläche - Vernetztes Handeln für nachhaltiges Wachstum. In: JOT Nr. 5 (2006)

[64] Szyszka, B.; Pflug, A.; Berg, S.; Nyberg, T.; Simons, C.; Weigert, M.; Kiriakidis, G.; Christoulakis, S.: Sputter Yield Amplification - a promising route towards more efficient coating technology. In: Thin Film Materials (Heraeus) 9 (2006), S. 10-1

[65] Bräuer, G.; Diehl, W.; Frach, P.; Kirchhoff, V.; Sittinger, V.; Szyszka, B.; Vergöhl, M.: Plasma for surface technology - examples of current developments. In: SVC Annual Technical Conference Proceedings 50 (2007), S. 427-30

[66] Gläser, H. J.; Szyszka, B.: History of glass coating for architectural glazing. In: SVC Annual Technical Conference Proceedings 50 (2007), S. 216-29

[67] Ruske, F.; Sittinger, V.; Werner, W.; Szyszka, B.; Wiese, R.: Flux of positive ions and film growth in reactive sputtering of Al-doped ZnO thin films. In: Plasma Processes and Polymers 4 (2007), S. S336-40

[68] Ruske, F.; Jacobs, C.; Sittinger, V.; Szyszka, B.; Werner, W.: Large area ZnO:Al films with tailored light scattering properties for photovoltaic applications. In: Thin Solid Films 515 (2007), S. 8695-8

[69] Siemers, M.; Pflug, A.; Szyszka, B.: Three dimensional model for anomalous target erosion in magnetron sputtering. In: SVC Annual Technical Conference Proceedings 50 (2007), S. 405-8

[70] Sittinger, V.; Ruske, F.; Szyszka, B.; Christie, D. J.; Wallendorf, T.: Position and time resolved optical emission spectroscopy and film properties of ITO films deposited by high power pulsed magnetron sputtering. In: SVC Annual Technical Conference Proceedings 50 (2007), S. 144-9

[71] Szyszka, B.; Ruske, F.; Sittinger, V.; Pflug, A.; Werner, W.; Jacobs, C.; Kaiser, A.; Ulrich, S.: Transparent conductive oxides for display applications. In: Proceedings IMID (2007), S. 181-5

[72] Szyszka, B.; Brand, J.: Dünnschichttechnik im Automobil - unsichtbar, aber unverzichtbar. In: JOT Nr. 9 (2007), S. 56-9

[73] Uhlmann, P.; Frenzel, R.; Voit, B.; Mock, U.; Szyszka, B.; Schmidt, B.; Ondratschek, D.; Gochermann, J.; Roths, K.: Research agenda surfacte technology: Future demand for research in the field of coating materials. In: Progress in Organic Coatings 58 (2007), S. 122-6

[74] Elm, M. T.; Henning, T.; Klar, P. J.; Szyszka, B.: Effects of artificially structured micrometer holes on the transport behavior of Al-doped ZnO layers. In: Applied Physics Letters 93 (2008), S. 232101-1-3

[75] Ruske, F.; Pflug, A.; Sittinger, V.; Werner, W.; Szyszka, B.; Christie, D. J.: Reactive deposition of aluminium-doped zinc oxide thin films using high power pulsed magnetron sputtering. In: Thin Solid Films 516 (2008), S. 4472-7

[76] Sittinger, V.; Ruske, F.; Werner, W.; Jacobs, C.; Szyszka, B.; Christie, D. J.: High power pulsed magnetron sputtering of transparent conducting oxides. In: Thin Solid Films 516 (2008), S. 5847-59

[77] Szyszka, B.; Löbmann, P.; May, C.; Elsässer, C.; Gombert, A.: Development of advanced transparent conductive electrodes for large-area opto-electronic devices. In: SVC Annual Technical Conference Proceedings 51 (2008), S. 395-401

[78] Bewilogua, K.; Bräuer, G.; Dietz, A.; Gäbler, J.; Goch, G.; Karpuschewski,
B.; Szyszka, B.: Surface technology for automotive engineering. In: CIRP Annals Manufacturing Technology 58 (2009), S. 608-27

[79] Boentoro, W.; Pflug, A.; Szyszka, B.: Scratch resistance analysis of coatings on glass and polycarbonate. In: Thin Solid Films 517 (2009), S. 3121-5

[80] Dewald, W.; Sittinger, V.; Werner, W.; Jacobs, C.; Szyszka, B.: Optimization of process parameters for sputtering of ceramic ZnO:Al2O3 targets for a-Si:H/μc-Si:H solar cells. In: Thin Solid Films 518 (2009), S. 1085-90

[81] Dewald, W.; Sittinger, V.; Werner, W.; Szyszka, B.: Influence of strong magnetic fields on the growth of DC magnetron sputtered ZnO:Al films from a ceramic target. In: Proceedings PVSEC 24 (2009), S. 2824-6

[82] Horstmann, F.; Sittinger, V.; Szyszka, B.: Heat treatable indium tin oxide films deposited with high power pulse magnetron sputtering. In: Thin Solid Films 17 (2009), S. 3178-82

[83] Mahrholz, J.; Shikolenko, S.; Szyszka, B.; Jung, T.: Deposition of amorphous silicon films by gas flow sputtering (GFS). In: Proceedings PVSEC 24 (2009), S. 2879-83

[84] Polenzky, C.; Ulrich, S.; Szyszka, B.; Bywalez, R.; Götzendörfer, S.; Löbmann, P.: Transparent p-conducting materials for application in highly efficient thin film solar cells. In: Proceedings PVSEC 24 (2009), S. 285-8

[85] Pflug, A.; Siemers, M.; Szyszka, B.: Design tools and simulations for plasma processing in large area coaters. In: SVC Annual Technical Conference Proceedings 52 (2009), S. 364-9

[86] Sittinger, V.; Horstmann, F.; Boentoro, W.; Werner, W.; Szyszka, B.: Heat Treatable TCO Film for Position 1 Based on HiPIMS. In: SVC Annual Technical Conference Proceedings 52 (2009), S. 56-59

[87] Sittinger, V.; Diehl, W.; Szyszka, B.: Survey of Thin-Film Photovoltaics in Germany. In: SVC Annual Technical Conference Proceedings 52 (2009), S. 47-53

[88] Sittinger, V.; Ruske, F.; Dewald, W.; Werner, W.; Szyszka, B.: Comparison of Different Ceramic Al- doped ZnO Target Materials. In: Photovoltaic International Sixth Edition (2009), S. 101- 108

[89] Szyszka, B.; Sittinger, V.; Pflug, A.; Ulrich, S.; Kaiser, A.; Werner, W.: Reactive Magnetron Sputtering of ZnO:Al – A Status Report. In: SVC Annual Technical Conference Proceedings 52 (2009), S. 42-8

[90] Szyszka, B.; Georg, A.; Löbmann, P.; May, C.; Elsässer, C.: A multidisciplinary approach towards advanced transparent conductive electrodes. In: Proceedings Glass Performance Days, Finnland : Tampere, 12.-15.06.2009, S. 644-8

[91] Szyszka, B.; Ulrich, S.; Mahrholz, J.; Sittinger, V.; Pflug, A.; Schäfer, L.; Höfer, M.; Diehl, W.; Bräuer, G.: Coatings on glass for the solar century. In: Intelligent Glass Solutions Nr. 2 (2009), S. 64-7

[92] Ulrich, S.; Szyszka, B.; Dewald, W.: Comparison of SnO2:F based transparent conductive oxides for use in a-Si:H / µc-Si:H solar cells. In: Proceedings PVSEC 24 (2009), S. 2814-6

[93] Bräuer, G.; Szyszka, B.; Vergöhl, M.; Bandorf, R.: Magnetron sputtering - milestones of 30 years. In: Vacuum 84 (2010), S. 1354-9

[94] Sittinger, V.; Ruske, F.; Pflug, A.; Dewald, W.; Szyszka, B.; Dittmar, G.: Optical on-line monitoring for the long-term stabilization of a reactive mid-frequency puttering process of Al-doped zinc oxide films. In: Thin Solid Films 518 (2009), S. 3115-8

[95] Szyszka, B.; Löbmann, P.; Georg, A.; May, C.; Elsässer, C.: Development of new transparent conductors and device applications utilizing a multi disciplinary approach. In: Thin Solid Films 518 (2010), S. 3109-14

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Reviews

[1] Szyszka, B.: Magnetron sputtering of ZnO films. In: Transparent Conductive Zinc Oxide: Basics and Applications in Thin Film Solar Cells. Ellmer, K.; Rech, B.; Klein, A. (Hrsg.). Springer Series in Materials Science, 2007

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Eingeladene Vorträge – Deutschland

[1] Szyszka, B.; Pflug, A.; Malkomes, N.; Vergöhl, M.; Sittinger, V.: Modellierung optischer Schichtsysteme der Architekturglasbeschichtung. In: 2. Ellipsometrie-Workshop (Berlin : Bundesanstalt für Materialprüfung 18.-20.02.2002)

[2] Szyszka, B.: Transparent and conductive oxide films for optoelectronic devices. In: Frühjahrstagung der Deutschen Physikalischen Gesellschaft (Dresden 25.03.2003)

[3] Szyszka, B.; Sittinger, V.; Ulrich, S.; Pflug, A.; Horstmann, F.; Siemers, M.: TCO Großflächenbeschichtung. In: Frühjahrstagung der Deutschen Physikalischen Gesellschaft (Berlin 26.02.2008)

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Eingeladene Vorträge - International

[1] Szyszka, B.: Transparent conductive oxides – promising materials with challenging demands on coating technology. In: BELVAC symposium on optical properties of thin films (Belgien, Gent 31.10.1997)

[2] Szyszka, B.; Jiang, X.; Sittinger, V.; Pflug, A.; Hong, R. J..; Müller, J.; Rech, B.; Kluth, O.; Ruske, M.; Geyer, R.; Lechner, P.: Transparent and conductive layers for photovoltaic applications. In: E-MRS Spring Meeting (Frankreich, Strasbourg 18.-21.06.2002)

[3] Szyszka, B.; Hong, R.; Sittinger, V.; Ruske, F.; Werner, W.; Pflug, A.; Ruske, M.; Lopp, A.: Properties of ZnO:Al Films Deposited by In-Line Reactive AC Magnetron Sputtering. In: TOEO-3 (Japan, Tokyo 10.04.2003)

[4] Szyszka, B.; Pflug, A.; Sittinger, V.; Ruske, F.; Vergöhl, M.; Rickers, C.; Jung, T.; Ortner, K.: Advanced process technologies and layer stacks for large area deposition of optical coatings. In: 6th Symposium of European Vacuum Coaters (Italien, Anzio 29.09.2004)

[5] Szyszka, B.; Sittinger, V.; Pflug, A.; Ruske, F.: Material aspects for ZnO TCO films being important for a-Si:H/µc-Si:H thin film solar cells and display applications. In: 32nd International Conference on Metallurgical Coatings and Thin Films ICMCTF (USA, San Diego 02.-06.05.2005)

[6] B. Szyszka, V. Sittinger, F. Ruske, A. Pflug, W. Werner: Transparent and conductive ZnO:Al films: From thin film photovoltaics towards flat panel display technology. In: MRS Fall Meeting (USA, Boston 27.11.-05.12.2005)

[7] Szyszka, B.; Sittinger, V.; Ruske, F.; Pflug, A.; Werner, W.: Transparent and conductive ZnO:Al films: From thin film photovoltaics towards flat panel display technology. In: E-MRS Spring Meeting (Frankreich, Nizza, 29.05.-02.06.2006)

[8] Szyszka, B.; Ruske, F.; Sittinger, V.; Pflug, A.; Werner, W.; Jacobs, C.; Ulrich, S.; Kaiser, A.: Transparent conductive oxides for large area applications by in-line magnetron sputtering. In: 1st International Symposium on TCOs (Griechenland, Heraklion 23.-25.10.2006)

[9] Szyszka, B.; Jung, T.; Ortner, K.; Schmidt, F.; Sichelschmidt, J.; Sittinger, V.; Kaiser, A; Werner, W.: Hollow cathode gas flow sputtering of dielectrics and nanocomposite films. In: TOEO-5 (Japan, Tokyo 21.05.2007)

[10] Szyszka, B.; Ruske, F.; Sittinger, V.; Pflug, A.; Werner, W.; Gerloff, J.; Ulrich, S.: Transparent Conductive Oxides for Flat Panel Display Applications – An Overview. In: IMID (Südkorea, Daegu 28.08.2007)

[11] Szyszka, B.; Ortner, K.; Ulrich, S.; Polenzky, C.; Sittinger, V.; Horstmann, F.; Georg, A.; Borchert, D.; Löbmann, P.; Götzendorfer, S.; Wang, C.; May, C.; Tomita, Y.; Elsässer, C.; Kalivoda, E.: A multidisciplinary approach towards advanced transparent conductive electrodes. In: 2nd International Symposium on TCOs (Griechenland, Heraklion 24.10.2008)

[12] Szyszka, B.; Ortner, K.; Ulrich, S.; Polenzky, C.; Sittinger, V.; Horstmann, F.; Georg, A.; Borchert, D.; Löbmann, P.; Götzendorfer, S.; Wang, C.; May, C.; Tomita, Y.; Elsässer, C.; Körner, W.; Kalivoda, E.: A multidisciplinary approach towards advanced transparent conductive electrodes. In: TOEO-6 (Japan, Tokyo, 14.04.2009

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